write electron-beam lithography
- write electron-beam lithography
- skleistinė elektronpluoštė litografija
statusas T sritis radioelektronika
atitikmenys: angl. scanning electron-beam lithography; write electron-beam lithography
vok. Elektronenstrahlschreibenlithografie, f; Rasterelektronenstrahlithografie, f
rus. сканирующая электронно-лучевая литография, f
pranc. lithographie à faisceaux électroniques à balayage, f; lithographie électronique à balayage, f
Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“.
Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas.
2000.
Look at other dictionaries:
direct-write electron-beam lithography — tiesioginė elektronpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. direct write electron beam lithography vok. Elektronenstrahllithografie für direkte Waferbelichtung, f rus. непосредственная электронно лучевая… … Radioelektronikos terminų žodynas
Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
scanning electron-beam lithography — skleistinė elektronpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. scanning electron beam lithography; write electron beam lithography vok. Elektronenstrahlschreibenlithografie, f; Rasterelektronenstrahlithografie, f rus … Radioelektronikos terminų žodynas
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Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is … Wikipedia
X-ray lithography — is a next generation lithography that has been developed for the semiconductor industryref|vlad. Batches of microprocessors have already been produced. The short wavelengths of 0.8 nm X rays overcome diffraction limits in the resolution of… … Wikipedia
Field electron emission — It is requested that a diagram or diagrams be included in this article to improve its quality. For more information, refer to discussion on this page and/or the listing at Wikipedia:Requested images. Field emission (FE) (also known as field… … Wikipedia
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
Elektronenstrahlschreibenlithografie — skleistinė elektronpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. scanning electron beam lithography; write electron beam lithography vok. Elektronenstrahlschreibenlithografie, f; Rasterelektronenstrahlithografie, f rus … Radioelektronikos terminų žodynas
Rasterelektronenstrahlithografie — skleistinė elektronpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. scanning electron beam lithography; write electron beam lithography vok. Elektronenstrahlschreibenlithografie, f; Rasterelektronenstrahlithografie, f rus … Radioelektronikos terminų žodynas
